s4200 field emission sem (Hitachi Ltd)
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Hitachi Ltd
s4200 field emission sem
S4200 Field Emission Sem, supplied by Hitachi Ltd, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/s4200+field+emission+sem/10__1007_slash_s11051___018___4302___7-64-9-11
Average 90 stars, based on 1 article reviews
S4200 Field Emission Sem, supplied by Hitachi Ltd, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/s4200+field+emission+sem/10__1007_slash_s11051___018___4302___7-64-9-11
Average 90 stars, based on 1 article reviews
s4200 field emission sem - by Bioz Stars,
2026-09
90/100 stars
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other:Article Title: Exposure assessment of process by-product nanoparticles released during the preventive maintenance of semiconductor fabrication facilities Article Snippet: This study characterized the process byproduct particles (mostly nanoparticles) released during the preventive maintenance of semiconductor fabrication facilit ies, such as chemical mechanical planarization (CMP), plasma-enhanced chemical vapor deposition (PECVD), and ion implantation.. Manual sampling and real-time measurements with direct reading instruments were conducted to assess the exposure levels of nanoparticles and their physical and chemical properties.. Significant amount of nanoparticles were observed in the breathing zone of the workers during the maintenance of the PECVD and ion implanters with the peak number concentrations as high as 6,470,000 and 65,444 #/cm, respectively, indicating that the deposited residual chemicals in the reaction chambers were released as airborne nanoparticles by the maintenance activities. |